Igor Kaganovich

  • phone: 609-243-3277
  • email: ikaganov@pppl.gov

Dr. Kaganovich is a Principal Research Physicist at Princeton Plasma Physics Laboratory and Deputy Head of the Theory Department of the Princeton Plasma Physics Laboratory. He received his Ph.D. at the Ioffe Physical-Technical Institute, Russia (1992), in plasma physics. He has worked in leading plasma-physics, applied-physics and chemical-engineering research centers in U.S.A., Russia, Germany, and Belgium. He serves as Associate Editor of Physics of Plasmas, and Co-Director of the Princeton Laboratory for Plasma Nanosynthesis.

His research interests include: beam-plasma interactions, high energy density plasmas, plasma synthesis of nanomaterials, atomic physics, and physics of partially-ionized plasmas. He and his students and postdoctoral colleagues have authored about 120 papers in many areas of plasma physics focusing on kinetic and collective effects in plasmas and particle beams with applications to laboratory and space plasmas, nuclear fusion, electric propulsion, gas discharges, and plasma processing.

He was elected a Fellow of the American Physical Society in 2007 and received Alexander von Humboldt Fellowship in 1996

  • "Band Structure of the Growth Rate of the Two-Stream Instability of an Electron Beam Propagating in a Bounded Plasma"
    I.D. Kaganovich & D. Sydorenko, arXiv:1503.04695
  • "Absence of Debye Sheaths due to Secondary Electron Emission"
    M.D. Campanell, A.V. Khrabrov & I.D. Kaganovich, Phys. Rev. Lett. 108, 255001 (2012)
  • "Revisiting anomalous RF field penetration into a warm plasma"
    Igor D. Kaganovich, Oleg V. Polomarov & Constantine E. Theodosiou, IEEE T. Plasma Sci. 34, 696 (2006)
  • DoE highlights : Helping General Electric Upgrade the U.S. Power Grid; Riding an electron wave into the future of microchip; Two-stream instability of an electron beam propagating in a bounded plasma; Complex Electron Energy Distribution in Asymmetric RF-DC Discharge; Sheath-induced instabilities in magnetized plasmas; Controlling plasma properties: electron induced secondary electron emission.